Introduction to Focused Ion Beam Technology and its Application

Kranz, Christine

Title:

Introduction to Focused Ion Beam Technology and its Application

dc.contributor.author	Kranz, Christine
dc.contributor.corporatename	Georgia Institute of Technology. School of Chemistry and Biochemistry
dc.date.accessioned	2008-01-31T20:05:03Z
dc.date.available	2008-01-31T20:05:03Z
dc.date.issued	2008-01-22
dc.description	Dr. Christine Kranz, School of Chemistry and Biochemistry presented a lecture at the Nano@Tech Meeting on January 22, 2008 at 12 noon in room 102 of the MiRC building	en_US
dc.description	Runtime: 60:14 minutes
dc.description.abstract	Within the last decade Focused Ion Beam technology has developed from a routine semiconductor tool into a versatile research instrument for characterization and prototyping. A major step towards the convergence of nanotechnology and nanoscience is the development and utilization of technologies, which allow precise patterning and assembly of features at a nanoscale. Dual beam FIB/SEM technology provides unsurpassed control and resolution during milling, deposition, and characterization at the nanoscale, thereby enabling high-resolution 3-D prototyping, machining, and structuring crucial to the development of next-generation functional nanodevices. An unambiguous advantage of FIB technology is the possibility for maskless milling and deposition processes. Application of FIB technology includes failure analysis, circuit repair and mask repair in microelectronics and TEM sample preparation. Recently, FIB has been also used in fabrication of scanning probe tips, optical devices and sensor technology. Nanostructuring using focused ion beams is governed by different parameters given by the beam profile, by the angle of incidence, by ion species, ion dose, and energy, and by the structural and chemical change of the sample by ion implantation. Within this presentation an overview of this technology along with novel applications but also limitations will be presented.	en_US
dc.format.extent	60:14 minutes
dc.identifier.uri	http://hdl.handle.net/1853/19615
dc.language.iso	en_US	en_US
dc.publisher	Georgia Institute of Technology	en_US
dc.relation.ispartofseries	Nano@Tech Lecture Series
dc.subject	Nanotechnology	en_US
dc.subject	Focused Ion Beam technology	en_US
dc.subject	Fabrication of nanodevices
dc.subject	Ion implantation
dc.subject	Maskless milling and deposition processes
dc.title	Introduction to Focused Ion Beam Technology and its Application	en_US
dc.type	Moving Image
dc.type	Audio
dc.type.genre	Lecture
dc.type.genre	Presentation
dspace.entity.type	Publication
local.contributor.corporatename	Institute for Electronics and Nanotechnology (IEN)
local.relation.ispartofseries	Nano@Tech Lecture Series
relation.isOrgUnitOfPublication	5d316582-08fe-42e1-82e3-9f3b79dd6dae
relation.isSeriesOfPublication	accfbba8-246e-4389-8087-f838de8956cf