Title:
Introduction to Focused Ion Beam Technology and its Application
Introduction to Focused Ion Beam Technology and its Application
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Author(s)
Kranz, Christine
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Abstract
Within the last decade Focused Ion Beam technology has
developed from a routine semiconductor tool into a versatile research
instrument for characterization and prototyping. A major step towards
the convergence of nanotechnology and nanoscience is the development
and utilization of technologies, which allow precise patterning and
assembly of features at a nanoscale. Dual beam FIB/SEM technology
provides unsurpassed control and resolution during milling,
deposition, and characterization at the nanoscale, thereby enabling
high-resolution 3-D prototyping, machining, and structuring crucial
to the development of next-generation functional nanodevices. An
unambiguous advantage of FIB technology is the possibility for
maskless milling and deposition processes. Application of FIB
technology includes failure analysis, circuit repair and mask repair
in microelectronics and TEM sample preparation. Recently, FIB has
been also used in fabrication of scanning probe tips, optical devices
and sensor technology. Nanostructuring using focused ion beams is
governed by different parameters given by the beam profile, by the
angle of incidence, by ion species, ion dose, and energy, and by the
structural and chemical change of the sample by ion implantation.
Within this presentation an overview of this technology along with
novel applications but also limitations will be presented.
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Date Issued
2008-01-22
Extent
60:14 minutes
Resource Type
Moving Image
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Audio
Resource Subtype
Lecture
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Presentation