Plasma Processing of Thin Films [Part I and II]

Hess, Dennis W.

Title:

Plasma Processing of Thin Films [Part I and II]

dc.contributor.author	Hess, Dennis W.
dc.contributor.corporatename	Georgia Institute of Technology. Institute for Electronics and Nanotechnology	en_US
dc.contributor.corporatename	Georgia Institute of Technology. School of Chemical and Biomolecular Engineering	en_US
dc.date.accessioned	2014-09-10T15:34:30Z
dc.date.available	2014-09-10T15:34:30Z
dc.date.issued	2014-09-02
dc.description	Dennis W. Hess is the Thomas C. DeLoach Jr., Professor of Chemical and Biomolecular Engineering at the Georgia Institute of Technology. His research interests include thin films, surfaces, and interfaces, especially as applied to microelectronics and polymer processing. He received a B.S. in Chemistry from Albright College, and M.S. and Ph.D. degrees in Physical Chemistry from Lehigh University.	en_US
dc.description	Presented on September 2, 2014 and September 4, 2014 at 12:00 p.m. in the Marcus Nanotechnology Building Conference Room 1117.	en_US
dc.description	Runtime: 49:03 minutes	en_US
dc.description	Runtime: 30:14 minutes
dc.description.abstract	Fabrication of devices and structures for integrated circuits, sensors, photonics, and MEMS/NEMS requires layers of patterned thin films. For nearly all film materials, patterns are generated by lithographic processes, followed by plasma etching. Plasmas or glow discharges are ionized gases that contain electrons, ions, neutral species and photons that promote chemical reactions and ensure that anisotropic etch profiles can be obtained. This tutorial will discuss the fundamental physics and chemistry of plasmas, plasma reactor configurations, unique properties of plasmas that allow thin film processing for a variety of applications, and approaches to control etch rates, profiles, and etch selectivity.	en_US
dc.embargo.terms	null	en_US
dc.format.extent	49:03 minutes
dc.format.extent	30:14 minutes
dc.identifier.uri	http://hdl.handle.net/1853/52351
dc.relation.ispartof	IEN Technical Seminars
dc.relation.ispartof	Advanced Fabrication
dc.subject	Device fabrication	en_US
dc.subject	Integrated circuits	en_US
dc.subject	Lithography	en_US
dc.subject	MEMS	en_US
dc.subject	Plasma etching	en_US
dc.title	Plasma Processing of Thin Films [Part I and II]	en_US
dc.type	Moving Image
dc.type.genre	Presentation
dspace.entity.type	Publication
local.contributor.author	Hess, Dennis W.
local.contributor.corporatename	Institute for Electronics and Nanotechnology (IEN)
relation.isAuthorOfPublication	d67d8fd4-bfc1-40ca-a898-03b84faf1c0d
relation.isOrgUnitOfPublication	5d316582-08fe-42e1-82e3-9f3b79dd6dae