Title:
Plasma Processing of Thin Films [Part I and II]
Plasma Processing of Thin Films [Part I and II]
No Thumbnail Available
Author(s)
Hess, Dennis W.
Advisor(s)
Editor(s)
Collections
Supplementary to
Permanent Link
Abstract
Fabrication of
devices and structures for integrated circuits, sensors, photonics, and
MEMS/NEMS requires layers of patterned thin films. For nearly all film
materials, patterns are generated by lithographic processes, followed by
plasma etching. Plasmas or glow discharges are ionized gases that contain
electrons, ions, neutral species and photons that promote chemical reactions
and ensure that anisotropic etch profiles can be obtained. This tutorial
will discuss the fundamental physics and chemistry of plasmas, plasma reactor
configurations, unique properties of plasmas that allow thin film processing
for a variety of applications, and approaches to control etch rates,
profiles, and etch selectivity.
Sponsor
Date Issued
2014-09-02
Extent
49:03 minutes
30:14 minutes
30:14 minutes
Resource Type
Moving Image
Resource Subtype
Presentation