Plasma Etching: An Overview of Equipment and Processing at IEN

Thomas, Mikkel A.

Title:

Plasma Etching: An Overview of Equipment and Processing at IEN

dc.contributor.author	Thomas, Mikkel A.
dc.contributor.corporatename	Georgia Institute of Technology. Institute for Electronics and Nanotechnology	en_US
dc.contributor.corporatename	Southeastern Nanotechnology Infrastructure Corridor	en_US
dc.date.accessioned	2020-06-16T11:57:08Z
dc.date.available	2020-06-16T11:57:08Z
dc.date.issued	2020-05-28
dc.description	Presented on May 28, 2020 from 11:00 a.m.-12:00 p.m. SENIC Technical Webinar Series: Session 6.	en_US
dc.description	The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech hosted a series of online technical seminars, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.	en_US
dc.description	Dr. Mikkel Thomas has worked for the Institute for Electronics and Nanotechnology since 2008. He earned a Bachelor of Science in Electrical Engineering in 1997, a Master’s of Science in Electrical Engineering in 1999 and a Ph.D in Electrical Engineering with a specialization in Optoelectronics in 2008, all from the Georgia institute of Technology. Prior to his employment at Georgia Tech, Dr. Thomas worked at OptiComp Corporation located in Zephyr Cove, Nevada. His research at the company revolved around the development of a VCSEL based, integrated optical communication system for use in satellites and other aerospace applications. Since arriving at Georgia Tech, in the IEN, Dr. Thomas provides cleanroom processing support to the academic faculty and their graduate students. He also provides processing support and fabrication services for entities not directly affiliated with the institute. He is the current lab instructor for ChBE 4050.	en_US
dc.description	Runtime: 63:17 minutes
dc.description.abstract	Etching is one of the fundamental building blocks of microelectronic fabrication. Removing material through chemical or physical means is an essential skill found in most microelectronics laboratories. The Institute for Electronics and Nanotechnology (IEN) at Georgia Tech offers a wide variety of tools and technologies to etch materials during a multitude of fabrication processes. Tools range from typical plasma enhanced etchers to vapor based etchers. With 15+ etch tools in the facility, IEN staff has the flexibility to configure each tool with a different selection of gases, which enables different etch capabilities and allow the IEN to segregate processes within the facility. In this seminar, a brief introduction to the tools and technologies available in the IEN cleanrooms will be presented. Common etching issues and concerns will also be discussed.	en_US
dc.format.extent	63:17 minutes
dc.identifier.uri	http://hdl.handle.net/1853/62940
dc.language.iso	en_US	en_US
dc.publisher	Georgia Institute of Technology	en_US
dc.relation.ispartof	Southeastern Nanotechnology Infrastructure Corridor (SENIC)
dc.subject	Etching	en_US
dc.subject	Fabrication	en_US
dc.subject	Nanotechnology	en_US
dc.title	Plasma Etching: An Overview of Equipment and Processing at IEN	en_US
dc.title.alternative	Etching at GT-IEN: A Review of Processes and Equipment	en_US
dc.type	Moving Image
dc.type.genre	Presentation
dspace.entity.type	Publication
local.contributor.corporatename	Institute for Electronics and Nanotechnology (IEN)
relation.isOrgUnitOfPublication	5d316582-08fe-42e1-82e3-9f3b79dd6dae