Title:
Plasma Etching: An Overview of Equipment and Processing at IEN
Plasma Etching: An Overview of Equipment and Processing at IEN
Author(s)
Thomas, Mikkel A.
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Abstract
Etching is one of the fundamental building blocks of microelectronic fabrication. Removing material through chemical or physical means is an essential skill found in most microelectronics laboratories. The Institute for Electronics and Nanotechnology (IEN) at Georgia Tech offers a wide variety of tools and technologies to etch materials during a multitude of fabrication processes. Tools range from typical plasma enhanced etchers to vapor based etchers. With 15+ etch tools in the facility, IEN staff has the flexibility to configure each tool with a different selection of gases, which enables different etch capabilities and allow the IEN to segregate processes within the facility. In this seminar, a brief introduction to the tools and technologies available in the IEN cleanrooms will be presented. Common etching issues and concerns will also be discussed.
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Date Issued
2020-05-28
Extent
63:17 minutes
Resource Type
Moving Image
Resource Subtype
Presentation