Title:
Method For Ion Implantation Induced Embedded Particle Formation Via Reduction
Method For Ion Implantation Induced Embedded Particle Formation Via Reduction
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Abstract
A method for ion implantation induced embedded particle formation via reduction with the steps of ion implantation with an ion/element that will chemically reduce the chosen substrate material, implantation of the ion/element to a sufficient concentration and at a sufficient energy for particle formation, and control of the temperature of the substrate during implantation. A preferred embodiment includes the formation of particles which are nano-dimensional ( <100 m-n in size). The phase of the particles may be affected by control of the substrate temperature during and/or after the ion implantation process.
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9/25/2001
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Patent