Title:
A study of the effect of ionization efficiency during deposition on the properties of chromium PVD films
A study of the effect of ionization efficiency during deposition on the properties of chromium PVD films
| dc.contributor.advisor | Hochman, Robert F. | |
| dc.contributor.author | Yu, Chen-Hua Douglas | en_US |
| dc.contributor.department | Materials Engineering | |
| dc.date.accessioned | 2008-02-21T12:32:51Z | |
| dc.date.available | 2008-02-21T12:32:51Z | |
| dc.date.issued | 1987-12 | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.identifier.bibid | 308900 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1853/20003 | |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.rights | Access restricted to authorized Georgia Tech users only. | en_US |
| dc.subject.lcsh | Materials Fatigue | en_US |
| dc.subject.lcsh | Surfaces (Technology) | en_US |
| dc.subject.lcsh | Materials | en_US |
| dc.title | A study of the effect of ionization efficiency during deposition on the properties of chromium PVD films | en_US |
| dc.type | Text | |
| dc.type.genre | Dissertation | |
| dspace.entity.type | Publication | |
| local.contributor.advisor | Hochman, Robert F. | |
| local.contributor.corporatename | School of Materials Science and Engineering | |
| local.contributor.corporatename | College of Engineering | |
| relation.isAdvisorOfPublication | c2f9fa64-7cf9-45f0-9f07-74a596bc2d25 | |
| relation.isOrgUnitOfPublication | 21b5a45b-0b8a-4b69-a36b-6556f8426a35 | |
| relation.isOrgUnitOfPublication | 7c022d60-21d5-497c-b552-95e489a06569 |
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