Title:
Effective Interfaces in Silicon Heterojunction Solar Cells

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Wang, T. H.
Page, M. R.
Yan, Y.
Branz, H. M.
Rohatgi, Ajeet
Wang, Q.
Yelundur, Vijay
Levi, D. H.
Iwaniczko, E.
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Abstract
Thin hydrogenated amorphous silicon (a-Si:H) layers deposited by hot-wire chemical vapor deposition (HWCVD) are investigated for use in silicon heterojunction (SHJ) solar cells on p-type crystalline silicon wafers. A requirement for excellent emitter quality is minimization of interface recombination. Best results necessitate immediate a-Si:H deposition and an abrupt and flat interface to the c-Si substrate. We obtain a record planar HJ efficiency of 16.9% with a high Voc of 652 mV on p-type float-zone (FZ) silicon substrates with HWCVD a-Si:H(n) emitters and screen-printed Al-BSF contacts. H pretreatment by HWCVD is beneficial when limited to a very short period prior to emitter deposition.
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2005-01
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