Title:
Thermochemical Nanolithography Components, Systems, And Methods
Thermochemical Nanolithography Components, Systems, And Methods
dc.contributor.patentcreator | Riedo, Elisa | |
dc.contributor.patentcreator | Marder, Seth R. | |
dc.contributor.patentcreator | De Heer, Walt A. | |
dc.contributor.patentcreator | Szoskiewicz, Robert J. | |
dc.contributor.patentcreator | Kodali, Vamsi K. | |
dc.contributor.patentcreator | Jones, Simon C. | |
dc.contributor.patentcreator | Okada, Takashi | |
dc.contributor.patentcreator | Wang, Debin | |
dc.contributor.patentcreator | Curtis, Jennifer E. | |
dc.contributor.patentcreator | Henderson, Clifford L. | |
dc.contributor.patentcreator | Hua, Yueming | |
dc.date.accessioned | 2017-05-12T14:26:02Z | |
dc.date.available | 2017-05-12T14:26:02Z | |
dc.date.filed | 6/1/2010 | |
dc.date.issued | 6/18/2013 | |
dc.description.abstract | Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed. | |
dc.description.assignee | Georgia Tech Research Corporation | |
dc.identifier.cpc | B82Y10/00 | |
dc.identifier.cpc | B82Y40/00 | |
dc.identifier.cpc | G03F7/0002 | |
dc.identifier.patentapplicationnumber | 12/791466 | |
dc.identifier.patentnumber | 8468611 | |
dc.identifier.uri | http://hdl.handle.net/1853/56771 | |
dc.identifier.uspc | 850/33 | |
dc.title | Thermochemical Nanolithography Components, Systems, And Methods | |
dc.type | Text | |
dc.type.genre | Patent | |
dspace.entity.type | Publication | |
local.contributor.corporatename | Georgia Institute of Technology | |
local.relation.ispartofseries | Georgia Tech Patents | |
relation.isOrgUnitOfPublication | cc30e153-7a64-4ae2-9b1d-5436686785e3 | |
relation.isSeriesOfPublication | 0f49c79d-4efb-4bd9-b060-5c7f9191b9da |
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