Person:
Wong,
C. P.
Wong,
C. P.
Permanent Link
Associated Organization(s)
Organizational Unit
ORCID
ArchiveSpace Name Record
5 results
Publication Search Results
Now showing
1 - 5 of 5
-
ItemEnhanced Electrical Properties of Anisotropic Conductive Adhesive With $pi$ -Conjugated Self-Assembled Molecular Wire Junctions(Georgia Institute of Technology, 2009-09) Zhang, Rongwei ; Li, Yi ; Yim, Myung Jin ; Moon, Kyoung-Sik ; Lu, Daoqiang ; Wong, C. P.We have investigated the electrical properties of anisotropic conductive adhesive (ACA) joint using submicrometer- sized ( 500 nm in diameter) silver (Ag) particle as conductive filler with the effect of -conjugated self-assembled molecular wires. The ACAs with submicrometer-sized Ag particles have higher current carrying capability ( 3400 mA) than those with micro-sized Au-coated polymer particles ( 2000 mA) and Ag nanoparticles ( 2500 mA). More importantly, by construction of -conjugated self-assembled molecular wire junctions between conductive particles and integrated circuit (IC)/substrate, the electrical conductivity has increased by one order of magnitude and the current carrying capability of ACAs has improved by 600 mA. The crucial factors that govern the improved electrical properties are discussed based on the study of alignments and thermal stability of molecules on the submicrometer-sized Ag particle surface with surface-enhanced Raman spectroscopy (SERS), providing a fundamental understanding of conduction mechanism in ACA joints and guidelines for the formulation of high-performance ACAs in electronic packaging industry.
-
ItemNear Void-Free Assembly Development of Flip Chip Using No-Flow Underfill(Georgia Institute of Technology, 2009-04) Lee, Sangil ; Yim, Myung Jin ; Master, Raj N. ; Wong, C. P. ; Baldwin, Daniel F.The advanced flip-chip-in-package (FCIP) process technology, using no-flow underfill material for high I/O density (over 3000 I/O) and fine-pitch (down to 150 μm) interconnect applications, presents challenges for flip chip processing because underfill void formation during reflow drives interconnect yield down and degrades reliability. In spite of such challenges, a high yield, reliable assembly process (> 99.99%) has been achieved using commercial no-flow underfill material with a high I/O, fine-pitch FCIP. This has been obtained using design of experiments with physical interpretation techniques. Statistical analysis determined what assembly conditions should be used in order to achieve robust interconnects without disrupting the FCIP interconnect structure. However, the resulting high yield process had the side effect of causing a large number of voids in the FCIP assemblies. Parametric studies were conducted to develop assembly process conditions that would minimize the number of voids in the FCIP induced by thermal effects. This work has resulted in a significant reduction in the number of underfill voids. This paper presents systematic studies into yield characterization, void formation characterization, and void reduction through the use of structured experimentation which was designed to improve assembly yield and to minimize the number of voids, respectively, in FCIP assemblies.
-
ItemNovel Nano-Scale Conductive Films With Enhanced Electrical Performance and Reliability for High Performance Fine Pitch Interconnect(Georgia Institute of Technology, 2009-02) Li, Yi ; Yim, Myung Jin ; Moon, Kyoung-Sik ; Wong, C. P.In this paper, a novel nano-scale conductive film which combines the advantages of both traditional anisotropic conductive adhesives/films (ACAs/ACFs) and nonconductive adhesives/films (NCAs/NCFs) is introduced for next generation high-performance ultra-fine pitch packaging applications. This novel interconnect film possesses the properties of electrical conduction along the z direction with relatively low bonding pressure (ACF-like) and the ultra-fine pitch (< 30 μm) capability (NCF-like). The nano-scale conductive film also allows a lower bonding pressure than NCF to achieve a much lower joint resistance (over two orders of magnitude lower than typical ACF joints) and higher current carrying capability. With low temperature sintering of nano-silver fillers, the joint resistance of the nano-scale conductive film was as low as 10―5 Ohm. The reliability of the nano-scale conductive film after high temperature and humidity test (85°C/85% RH) was also improved compared to the NCF joints. The insertion loss of nano-scale conductive film joints up to 10 GHz was almost the same as that of the standard ACF or NCF joints, suggesting that the nano-scale conductive film is suitable for reliable high-frequency adhesive joints in microelectronics packaging.
-
ItemVoid Formation Study of Flip Chip in Package Using No-Flow Underfill(Georgia Institute of Technology, 2008-10) Lee, Sangil ; Yim, Myung Jin ; Master, Raj N. ; Wong, C. P. ; Baldwin, Daniel F.The advanced flip chip in package (FCIP) process using no-flow underfill material for high I/O density and fine-pitch interconnect applications presents challenges for an assembly process that must achieve high electrical interconnect yield and high reliability performance. With respect to high reliability, the voids formed in the underfill between solder bumps or inside the solder bumps during the no-flow underfill assembly process of FCIP devices have been typically considered one of the critical concerns affecting assembly yield and reliability performance. In this paper, the plausible causes of underfill void formation in FCIP using no-flow underfill were investigated through systematic experimentation with different types of test vehicles. For instance, the effects of process conditions, material properties, and chemical reaction between the solder bumps and no-flow underfill materials on the void formation behaviors were investigated in advanced FCIP assemblies. In this investigation, the chemical reaction between solder and underfill during the solder wetting and underfill cure process has been found to be one of the most significant factors for void formation in high I/O and fine-pitch FCIP assembly using no-flow underfill materials.
-
ItemInvestigation of electrical contact resistance for nonconductive film functionalized with Π -conjugated self-assembled molecules(Georgia Institute of Technology, 2007-02-26) Dong, Hai ; Li, Yi ; Yim, Myung Jin ; Moon, Kyoung-Sik ; Wong, C. P.Nonconductive adhesive/nonconductive film (NCA/NCF) bonding technology has attracted increasing research interests as lead-free interconnect. During bonding, heat and pressure are applied and the direct physical contacts between the two surfaces of integrated circuit bump and substrate bond pad can be achieved. The electrical contact resistance of a NCA/NCF joint is controlled by the pressure, roughness and NCA/NCF material properties. An accurate prediction of contact resistance can help guide experiment setup towards improving the electrical performance of NCA/NCF. In this study, a model is developed and correlated to experiments. The effects of NCA/NCF material properties on electrical contact resistance are investigated.