Person:
Tolbert,
Laren M.
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High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors
Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups
Comparison of positive tone versus negative tone resist pattern collapse behavior
Nonionic photoacid generator behavior under high-energy exposure sources
Single-component molecular resists containing bound photoacid generator functionality
Influence of solubility switching mechanism on resist performance in molecular glass resists