Tolbert, Laren M.
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11 results
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Item Comparison of positive tone versus negative tone resist pattern collapse behavior(Georgia Institute of Technology, 2010-11) Yeh, Wei-Ming; Noga, David E.; Lawson, Richard A.; Tolbert, Laren M.; Henderson, Clifford L.Item High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors(Georgia Institute of Technology, 2010-11) Lawson, Richard A.; Tolbert, Laren M.; Henderson, Clifford L.Item Single-component molecular resists containing bound photoacid generator functionality(Georgia Institute of Technology, 2010-01) Lawson, Richard A.; Tolbert, Laren M.; Henderson, Clifford L.Item Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups(Georgia Institute of Technology, 2009-11) Lawson, Richard A.; Noga, David E.; Younkin, Todd R.; Tolbert, Laren M.; Henderson, Clifford L.Item Nonionic photoacid generator behavior under high-energy exposure sources(Georgia Institute of Technology, 2009-10) Lawson, Richard A.; Noga, David E.; Tolbert, Laren M.; Henderson, Clifford L.Item Influence of solubility switching mechanism on resist performance in molecular glass resists(Georgia Institute of Technology, 2007-11) Lawson, Richard A.; Lee, Cheng-Tsung; Henderson, Clifford L.; Whetsell, Robert; Tolbert, Laren M.; Yueh, WangItem Charge distribution in photoexcited molecules(Georgia Institute of Technology, 1990-05) Tolbert, Laren M.Item Biooxidation of arylalkyl hydrocarbons(Georgia Institute of Technology, 1989-07) Tolbert, Laren M.Item Fundamentals of carbanion photochemistry(Georgia Institute of Technology, 1989) Tolbert, Laren M.Item Bio-oxidation of arylalkyl hydrocarbons(Georgia Institute of Technology, 1989) Tolbert, Laren M.