Title:
Real-Time Control of Etching Processes: Experimental Results
Real-Time Control of Etching Processes: Experimental Results
| dc.contributor.author | Higman, Ted K. | |
| dc.contributor.author | Berg, Jordan M. | |
| dc.contributor.author | Tannenbaum, Allen R. | |
| dc.contributor.corporatename | Texas Tech University. Dept. of Mechanical Engineering | |
| dc.contributor.corporatename | University of Minnesota. Dept. of Electrical Engineering | |
| dc.date.accessioned | 2010-04-23T18:21:06Z | |
| dc.date.available | 2010-04-23T18:21:06Z | |
| dc.date.issued | 1997-10-01 | |
| dc.description | ©1997 SPIE--The International Society for Optical Engineering. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. The electronic version of this article is the complete one and can be found online at: http://dx.doi.org/10.1117/12.284645 | en_US |
| dc.description | Presented at Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, 1 October 1997, Austin, TX, USA | |
| dc.description | DOI: 10.1117/12.284645 | |
| dc.description.abstract | A unified approach to the modelling, simulation, and control of thin film processing is presented. The focus of this approach is to combine in-situ sensing with a model that deals directly with evolving surfaces. Using this method, and an in-situ process modelling technique (e.g., plasma emission spectroscopy during reactive ion etching) is used as a source of inout data for a model which deals exclusively with interface evolution. In this way, in-situ monitoring gives predictive process control capability, rather than simple end-point detection. | en_US |
| dc.identifier.citation | Jordan Berg, Ted K. Higman, Allen R. Tannenbaum, "Real-Time Control of Etching Processes: Experimental Results," Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, Abe Ghanbari, Anthony J. Toprac, editors, Proc. SPIE, Vol. 3213, 249 (1997) | en_US |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | http://hdl.handle.net/1853/32564 | |
| dc.language.iso | en_US | en_US |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.publisher.original | International Society for Optical Engineering | |
| dc.subject | Control | en_US |
| dc.subject | Estimation | en_US |
| dc.subject | Curvature driven flows | en_US |
| dc.subject | In-situ monitoring | en_US |
| dc.subject | Etching | en_US |
| dc.title | Real-Time Control of Etching Processes: Experimental Results | en_US |
| dc.type | Text | |
| dc.type.genre | Proceedings | |
| dspace.entity.type | Publication | |
| local.contributor.corporatename | Wallace H. Coulter Department of Biomedical Engineering | |
| relation.isOrgUnitOfPublication | da59be3c-3d0a-41da-91b9-ebe2ecc83b66 |