Title:
Enhanced carrier mobility and electrical stability of n-channel polymer thin film transistors by use of low-k dielectric buffer layer

dc.contributor.author Kim, Felix Sunjoo en_US
dc.contributor.author Hwang, Do-Kyung en_US
dc.contributor.author Kippelen, Bernard en_US
dc.contributor.author Jenekhe, Samson A. en_US
dc.contributor.corporatename Georgia Institute of Technology. Center for Organic Photonics and Electronics en_US
dc.contributor.corporatename University of Washington. Dept. of Chemical Engineering en_US
dc.contributor.corporatename University of Washington. Dept. of Chemistry en_US
dc.contributor.corporatename Georgia Institute of Technology. School of Electrical and Computer Engineering en_US
dc.date.accessioned 2013-05-29T18:28:38Z
dc.date.available 2013-05-29T18:28:38Z
dc.date.issued 2011-10
dc.description © 2011 American Institute of Physics. The electronic version of this article is the complete one and can be found at: http://dx.doi.org/10.1063/1.3655680 en_US
dc.description DOI: 10.1063/1.3655680 en_US
dc.description.abstract Insertion of a low-k polymer dielectric layer between the SiO₂ gate dielectric and poly(benzobisimidazobenzophenanthroline) (BBL) semiconductor of n-channel transistors is found to increase the field-effect mobility of electrons from 3.6 × 10⁻⁴ cm²/Vs to as high as 0.028 cm²/Vs. The enhanced carrier mobility was accompanied by improved multicycling stability and durability in ambient air. Studies of a series of eight polymer dielectrics showed that the electron mobility increased exponentially with decreasing dielectric constant, which can be explained to result from the reduced energetic expense of charge-carrier/dipole interaction. en_US
dc.identifier.citation Kim, Felix Sunjoo and Hwang, Do-Kyung and Kippelen, Bernard and Jenekhe, Samson A., "Enhanced carrier mobility and electrical stability of n-channel polymer thin film transistors by use of low-k dielectric buffer layer," Applied Physics Letters, 99, 17 (October 24 2011) en_US
dc.identifier.doi 10.1063/1.3655680
dc.identifier.issn 0003-6951
dc.identifier.uri http://hdl.handle.net/1853/47109
dc.publisher Georgia Institute of Technology en_US
dc.publisher.original American Institute of Physics en_US
dc.subject Carrier mobility en_US
dc.subject Low-k dielectric thin films en_US
dc.subject Organic field effect transistors en_US
dc.subject Organic semiconductors en_US
dc.subject Polymer films en_US
dc.subject Silicon compounds en_US
dc.subject Thin film transistors en_US
dc.title Enhanced carrier mobility and electrical stability of n-channel polymer thin film transistors by use of low-k dielectric buffer layer en_US
dc.type Text
dc.type.genre Article
dspace.entity.type Publication
local.contributor.author Kippelen, Bernard
local.contributor.corporatename Center for Organic Photonics and Electronics
relation.isAuthorOfPublication 89dff3fa-f69f-48dc-a1b2-89e73be81537
relation.isOrgUnitOfPublication 43f8dc5f-0678-4f07-b44a-edbf587c338f
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