(Georgia Institute of Technology, 2009-01-09)
Koh, Sau W.
Driven by the need for increase in system¡¯s functionality and decrease in the feature size, International Technology Roadmap for Semi-conductors has predicted that integrated chip packages will have interconnections with I/O pitch of 90 nm by the year 2018. Lead-based solder materials that have been used for many decades will not be able to satisfy the thermal mechanical requirements of these fines pitch packages. Of all the known interconnect technologies, nanostructured copper interconnects are the most promising for meeting the high performance requirements of next generation devices. However, there is a need to understand their material properties, deformation mechanisms and microstructural stability. The goal of this research is to study the mechanical strength and fatigue behavior of nanocrystalline copper using atomistic simulations and to evaluate their performance as nanostructured interconnect materials.
The results from the crack growth analysis indicate that nanocrystalline copper is a suitable candidate for ultra-fine pitch interconnects applications. This study has also predicts that crack growth is a relatively small portion of the total fatigue life of interconnects under LCF conditions.
The simulations result conducted on the single crystal copper nano-rods show that its main deformation mechanism is the nucleation of dislocations. In the case of nanocrystalline copper, material properties such as elastic modulus and yield strength have been found to be dependent on the grain size. Furthermore, it has been shown that there is competition between the dislocation activity and grain boundary sliding as the main deformation mode
This research has shown that stress induced grain coarsening is the main reason for loss of mechanical performance of nanocrystalline copper during cyclic loading. Further, the simulation results have also shown that grain growth during fatigue loading is assisted by the dislocation activity and grain boundary migration. A fatigue model for nanostructured interconnects has been developed in this research using the above observations
Lastly, simulations results have shown that addition of the antimony into nanocrystalline copper will not only increase the microstructure stability, it will also increase its strength.
(Georgia Institute of Technology, 2006-12-01)
Bansal, Shubhra
Nanocrystalline materials are being explored as potential off-chip interconnects materials for next generation microelectronics packaging. Mechanical behavior and deformation mechanisms in nanocrystalline copper and nickel have been explored. Nanostructured copper interconnections exhibit better fatigue life as compared to microcrystalline copper interconnects at a pitch of 100 and #956;m and lower. Nanocrystalline copper is quite stable upto 100 oC whereas nickel is stable even up to 400 oC. Grain boundary (GB) diffusion along with grain rotation and coalescence has been identified as the grain growth mechanism. Ultimate tensile and yield strength of nanocrystalline (nc) Cu and Ni are atleast 5 times higher than microcrystalline counterparts. Considerable amount of plastic deformation has been observed and the fracture is ductile in nature. Fracture surfaces show dimples much larger than grain size and stretching between dimples indicates localized plastic deformation. Activation energies for creep are close to GB diffusion activation energies indicating GB diffusion creep. Creep rupture at 45o to the loading axis and fracture surface shows lot of voiding and ductile kind of fracture. Grain rotation and coalescence along direction of maximum resolved shear stress plays an important role during creep. Grain refinement enhances the endurance limit and hence high cycle fatigue life. However, a deteriorating effect of grain refinement has been observed on low cycle fatigue life. This is because of the ease of crack initiation in nanomaterials. Persistent slip bands (PSBs) at an angle of 45o to loading axis are observed at higher strain ranges (> 1% for nc- Cu) with a width of about 50 nm. No relationship has been observed between PSBs and crack initiation. A non-recrystallization annealing treatment, 100 oC/ 2 hrs for nc- Cu and 250 oC/ 2 hrs for nc- Ni has been shown to improve the LCF life without lowering the strength much. Fatigue crack growth resistance is higher in nc- Cu and Ni compared to their microcrystalline counterparts. This is due to crack deflection at GBs leading to a tortuous crack path. Nanomaterials exhibit higher threshold stress intensity factors and effective threshold stress intensity is proportional to the elastic modulus of the material.