Title:
Fundamentals of Photomask Design
Fundamentals of Photomask Design
Authors
Hollerbach, Benjamin (Ben) P.
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Abstract
The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and greater device yield. A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented.
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Date Issued
2020-06-18
Extent
49:47 minutes
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Moving Image
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Presentation