Title:
Methods And Systems For Metal-assisted Chemical Etching Of Substrates

Thumbnail Image
Author(s)
Authors
Advisor(s)
Advisor(s)
Editor(s)
Associated Organization(s)
Organizational Unit
Series
Supplementary to
Abstract
Disclosed herein are various embodiments related to metal-assisted chemical etching of substrates on the micron, sub-micron and nano scales. In one embodiment, among others, a method for metal-assisted chemical etching includes providing a substrate; depositing a non-spherical metal catalyst on a surface of the substrate; etching the substrate by exposing the non-spherical metal catalyst and the substrate to an etchant solution including a composition of a fluoride etchant and an oxidizing agent; and removing the etched substrate from the etchant solution.
Sponsor
Date Issued
10/2/2012
Extent
Resource Type
Text
Resource Subtype
Patent
Rights Statement
Rights URI