Title:
RIE-Texturing of Multicrystalline Silicon Solar Cells
RIE-Texturing of Multicrystalline Silicon Solar Cells
Authors
Ruby, D. S.
Zaidi, S. H.
Narayanan, S.
Damiani, Benjamin Mark
Rohatgi, Ajeet
Zaidi, S. H.
Narayanan, S.
Damiani, Benjamin Mark
Rohatgi, Ajeet
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Abstract
We developed a maskless plasma texturing technique for multicrystalline silicon (mc-Si) cells using Reactive Ion Etching (RIE) that results in higher cell performance than that of standard untextured cells. Elimination of plasma damage has been achieved while keeping front reflectance to
extremely low levels. Internal quantum efficiencies as high as those on planar cells have been obtained, boosting cell
currents and efficiencies by up to 7% on evaporated metal and 4% on screen-printed cells.
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Date Issued
2001-06
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Text
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Proceedings