Title:
Fabrication of microchannels using polynorbornene photosensitive sacrificial materials

dc.contributor.author Wu, X. Q. en_US
dc.contributor.author Reed, H. A. en_US
dc.contributor.author Wang, Y. en_US
dc.contributor.author Rhodes, L. F. en_US
dc.contributor.author Elce, E. en_US
dc.contributor.author Ravikiran, R. en_US
dc.contributor.author Shick, R. A. en_US
dc.contributor.author Henderson, Clifford L. en_US
dc.contributor.author Allen, S. A. B. en_US
dc.contributor.author Kohl, Paul A. en_US
dc.contributor.corporatename Georgia Institute of Technology. Center for Organic Photonics and Electronics en_US
dc.date.accessioned 2013-06-27T19:45:01Z
dc.date.available 2013-06-27T19:45:01Z
dc.date.issued 2003-09
dc.description © 2003 The Electrochemical Society, Inc. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). en_US
dc.description.abstract A processing method has been demonstrated for the fabrication of microchannels using photosensitive polynorbornene copolymer based sacrificial materials. The channel geometric patterns of sacrificial polymer were made via photolithography. The sacrificial polymer patterns were encapsulated with a dielectric medium and then thermally decomposed to form air channels. For the thermal decomposition of sacrificial polymer, the heating program was determined on the basis of the kinetic model obtained from thermogravimetric analysis to maintain the decomposition at a constant rate. The results indicate that a properly selected heating program can avoid the deformation in the channel structure; at the same conditions, a large-size channel is more easily deformed than a small one. The tapered-structure microchannels were also produced using a gray-scale mask. The result shows that a suitably low contrast for the photosensitive sacrificial material can lead to smooth and tapered microchannels. en_US
dc.identifier.citation Wu, X. Q.; Reed, H. A.; Wang, Y.; Rhodes, L. F.; Elce, E.; Ravikiran, R.; Shick, R. A.; Henderson, Clifford L.; Allen, S. A. B. and Kohl, P. A., "Fabrication of microchannels using polynorbornene photosensitive sacrificial materials," Journal of the Electrochemical Society, Vol. 150, no.9, H205-H213 (September 2003). en_US
dc.identifier.doi 10.1149/1.1596955 en_US
dc.identifier.issn 0013-4651 (print) 1945-7111 (online)
dc.identifier.uri http://hdl.handle.net/1853/48097
dc.language.iso en_US en_US
dc.publisher Georgia Institute of Technology en_US
dc.publisher.original Electrochemical Society en_US
dc.subject Microfluidics en_US
dc.subject Photolithography en_US
dc.subject Polymer blends|Thermal analysis en_US
dc.title Fabrication of microchannels using polynorbornene photosensitive sacrificial materials en_US
dc.type Text
dc.type.genre Article
dspace.entity.type Publication
local.contributor.author Kohl, Paul A.
local.contributor.corporatename Center for Organic Photonics and Electronics
relation.isAuthorOfPublication 59670f7f-33e1-49ed-8098-ebe05443583b
relation.isOrgUnitOfPublication 43f8dc5f-0678-4f07-b44a-edbf587c338f
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