Title:
Methods Of Forming Oxide Masks With Submicron Openings And Microstructures Formed Thereby
Methods Of Forming Oxide Masks With Submicron Openings And Microstructures Formed Thereby
Files
Author(s)
Advisor(s)
Editor(s)
Collections
Supplementary to
Permanent Link
Abstract
Processing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio etched-trench microstructures that may be produced include single crystal resonators and sensors.
Sponsor
Date Issued
6/6/2006
Extent
Resource Type
Text
Resource Subtype
Patent