Title:
Empirical process planning for exposre controlled projection lithography

dc.contributor.advisor Rosen, David W.
dc.contributor.author Zhang, Ying
dc.contributor.committeeMember Jariwala, Amit
dc.contributor.committeeMember Colton, Jonathan
dc.contributor.department Mechanical Engineering
dc.date.accessioned 2017-01-11T14:02:17Z
dc.date.available 2017-01-11T14:02:17Z
dc.date.created 2016-12
dc.date.issued 2016-08-31
dc.date.submitted December 2016
dc.date.updated 2017-01-11T14:02:17Z
dc.description.abstract The stereolithography (SLA) process is a rapid prototyping technique in which a solid physical model of a part is made directly from a three dimensional CAD by repeatedly exposing ultraviolet light at certain regions with a liquid photopolymer resin bath. It is based on the principle of curing (hardening) a liquid photopolymer into a specific shape. The Exposure Controlled Projection Lithography (ECPL) process is developed based on SLA as a method to fabricate precise microstructure for micro-optics’ application. In the ECPL process, ultraviolet light patterned by a dynamic mask passes through a transparent substrate to cure liquid photopolymer resin into a desired shape. The dimensions of the part can be controlled by the exposure time and functional pixels in the dynamic mask. The primary objective of this research is to increase the accuracy of the process plan for fabricating micro-optical elements using the ECPL process. A process planning method to predict the shape of a part cured by the ECPL process is available in literature and is based on solving polymerization kinetics and irradiation model. The dimensional error of the cured part resulting from using this process planning method was about 15%. The goal for this research is to modify the existing process planning method to improve the dimensional accuracy and to reduce the dimensional error within 5%.
dc.description.degree M.S.
dc.format.mimetype application/pdf
dc.identifier.uri http://hdl.handle.net/1853/56266
dc.publisher Georgia Institute of Technology
dc.subject Photopolymerization
dc.subject Modeling
dc.subject Process plan
dc.title Empirical process planning for exposre controlled projection lithography
dc.type Text
dc.type.genre Thesis
dspace.entity.type Publication
local.contributor.advisor Rosen, David W.
local.contributor.author Zhang, Ying
local.contributor.corporatename George W. Woodruff School of Mechanical Engineering
local.contributor.corporatename College of Engineering
relation.isAdvisorOfPublication 8670f309-1b84-4a52-9641-bbb31a1d8af6
relation.isAuthorOfPublication c8db6e3e-6bee-4fa1-912c-f8f6817a96a3
relation.isOrgUnitOfPublication c01ff908-c25f-439b-bf10-a074ed886bb7
relation.isOrgUnitOfPublication 7c022d60-21d5-497c-b552-95e489a06569
thesis.degree.level Masters
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