Title:
Fundamentals of Photomask Design
Fundamentals of Photomask Design
dc.contributor.author | Hollerbach, Benjamin (Ben) P. | |
dc.contributor.corporatename | Georgia Institute of Technology. Institute for Electronics and Nanotechnology | en_US |
dc.contributor.corporatename | Southeastern Nanotechnology Infrastructure Corridor | en_US |
dc.date.accessioned | 2020-06-24T15:38:31Z | |
dc.date.available | 2020-06-24T15:38:31Z | |
dc.date.issued | 2020-06-18 | |
dc.description | Presented on June 18, 2020 from 11:00 a.m.-12:00 p.m. SENIC Technical Webinar Series: Session 9. | en_US |
dc.description | The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech hosted a series of online technical seminars, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research. | en_US |
dc.description | Mr. Ben Hollerbach is a Process-Equipment Engineer at Georgia Tech’s Institute for Electronics and Nanotechnology. He started working for the IEN in 2005 while a student at Georgia Tech. After received his bachelor’s degree in industrial design he began working full time for the IEN and in 2009 took over the management of the IEN’s Mask Shop. Over the past 11 years Ben has managed the evolution of photomask production from the use of a 1970’s era GCA Mann Pattern Generator & Stepper through first generation Laser Writers to today’s modern Heidelberg MLA150 Maskless Aligners. | en_US |
dc.description | Runtime: 49:47 minutes | en_US |
dc.description.abstract | The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and greater device yield. A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented. | en_US |
dc.format.extent | 49:47 minutes | |
dc.identifier.uri | http://hdl.handle.net/1853/62964 | |
dc.language.iso | en_US | en_US |
dc.publisher | Georgia Institute of Technology | en_US |
dc.relation.ispartof | Southeastern Nanotechnology Infrastructure Corridor (SENIC) | |
dc.subject | Fabrication | en_US |
dc.subject | Nanotechnology | en_US |
dc.subject | Photomask design | en_US |
dc.subject | Semiconductor devices | en_US |
dc.title | Fundamentals of Photomask Design | en_US |
dc.title.alternative | Fundamentals of Photomask Design and Designing for Direct-Write Lithography | |
dc.type | Moving Image | |
dc.type.genre | Presentation | |
dspace.entity.type | Publication | |
local.contributor.corporatename | Institute for Electronics and Nanotechnology (IEN) | |
relation.isOrgUnitOfPublication | 5d316582-08fe-42e1-82e3-9f3b79dd6dae |
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