Title:
Fundamentals of Photomask Design

dc.contributor.author Hollerbach, Benjamin (Ben) P.
dc.contributor.corporatename Georgia Institute of Technology. Institute for Electronics and Nanotechnology en_US
dc.contributor.corporatename Southeastern Nanotechnology Infrastructure Corridor en_US
dc.date.accessioned 2020-06-24T15:38:31Z
dc.date.available 2020-06-24T15:38:31Z
dc.date.issued 2020-06-18
dc.description Presented on June 18, 2020 from 11:00 a.m.-12:00 p.m. SENIC Technical Webinar Series: Session 9. en_US
dc.description The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech hosted a series of online technical seminars, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research. en_US
dc.description Mr. Ben Hollerbach is a Process-Equipment Engineer at Georgia Tech’s Institute for Electronics and Nanotechnology. He started working for the IEN in 2005 while a student at Georgia Tech. After received his bachelor’s degree in industrial design he began working full time for the IEN and in 2009 took over the management of the IEN’s Mask Shop. Over the past 11 years Ben has managed the evolution of photomask production from the use of a 1970’s era GCA Mann Pattern Generator & Stepper through first generation Laser Writers to today’s modern Heidelberg MLA150 Maskless Aligners. en_US
dc.description Runtime: 49:47 minutes en_US
dc.description.abstract The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and greater device yield. A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented. en_US
dc.format.extent 49:47 minutes
dc.identifier.uri http://hdl.handle.net/1853/62964
dc.language.iso en_US en_US
dc.publisher Georgia Institute of Technology en_US
dc.relation.ispartof Southeastern Nanotechnology Infrastructure Corridor (SENIC)
dc.subject Fabrication en_US
dc.subject Nanotechnology en_US
dc.subject Photomask design en_US
dc.subject Semiconductor devices en_US
dc.title Fundamentals of Photomask Design en_US
dc.title.alternative Fundamentals of Photomask Design and Designing for Direct-Write Lithography
dc.type Moving Image
dc.type.genre Presentation
dspace.entity.type Publication
local.contributor.corporatename Institute for Electronics and Nanotechnology (IEN)
relation.isOrgUnitOfPublication 5d316582-08fe-42e1-82e3-9f3b79dd6dae
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