Fundamentals of Photomask Design
Author(s)
Hollerbach, Benjamin (Ben) P.
Advisor(s)
Editor(s)
Collections
Supplementary to:
Permanent Link
Abstract
The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and greater device yield. A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented.
Sponsor
Date
2020-06-18
Extent
49:47 minutes
Resource Type
Moving Image
Resource Subtype
Presentation