Title:
Plasma processing of advanced interconnects for microelectronic applications
Plasma processing of advanced interconnects for microelectronic applications
| dc.contributor.advisor | Hess, Dennis W. | |
| dc.contributor.author | Li, Yiming | en_US |
| dc.contributor.department | Chemical Engineering | en_US |
| dc.date.accessioned | 2006-07-25T15:06:14Z | |
| dc.date.available | 2006-07-25T15:06:14Z | |
| dc.date.issued | 2002-08 | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.format.extent | 234 bytes | |
| dc.format.mimetype | text/html | |
| dc.identifier.bibid | 638739 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1853/11034 | |
| dc.language.iso | en_US | |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.rights | Access restricted to authorized Georgia Tech users only. | en_US |
| dc.subject.lcsh | Interconnects (Integrated circuit technology) | en_US |
| dc.subject.lcsh | Plasma chemistry | en_US |
| dc.subject.lcsh | Microelectronics Design and construction | en_US |
| dc.title | Plasma processing of advanced interconnects for microelectronic applications | en_US |
| dc.type | Text | |
| dc.type.genre | Dissertation | |
| dspace.entity.type | Publication | |
| local.contributor.advisor | Hess, Dennis W. | |
| local.contributor.corporatename | School of Chemical and Biomolecular Engineering | |
| local.contributor.corporatename | College of Engineering | |
| relation.isAdvisorOfPublication | d67d8fd4-bfc1-40ca-a898-03b84faf1c0d | |
| relation.isOrgUnitOfPublication | 6cfa2dc6-c5bf-4f6b-99a2-57105d8f7a6f | |
| relation.isOrgUnitOfPublication | 7c022d60-21d5-497c-b552-95e489a06569 |
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