CMOS Fabrication-Compatible Bragg Grating Devices and Applications
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Author(s)
Saha, Gareeyasee
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Abstract
Optical communication forms the backbone of our modern-day lives and is ubiquitous in all realms – from long range communication to communication within and across chips. Silicon Photonics is an emerging field wherein an already existing vast and robust infrastructure for the fabrication of CMOS devices can be leveraged to implement optical communication technologies in a small form-factor. These commercial silicon photonic foundries offer advantages of large-scale volume manufacturing and integration of electronics and photonics, and their operation is typically enabled by 193nm DUV lithography. With current efforts underway for rapid commercialization, it is important to understand the existing fabrication landscape and its impact on device performance to design reliable, state-of-the-art photonic devices.
The objective of the proposed research is to design Bragg gratings-based devices that are modified and optimized for fabrication on CMOS foundries that employ DUV photolithography techniques. Subsequently, some applications of such devices are explored, followed by practical considerations for their implementation.
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2022-12-14
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Text
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Dissertation