Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects

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Wu, Shun-Der
Maikisch, Jonathan S.
Glytsis, Elias N.
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http://hdl.handle.net/1853/45419
Abstract
The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the −1 forward-diffracted order are 37.3% , 67.1% , and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.
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2006-01
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