Title:
Vibration analysis of electroplated copper compliant interconnects

dc.contributor.advisor Sitaraman, Suresh K.
dc.contributor.author Chung, Philip Y.
dc.contributor.committeeMember Neu, Richard W.
dc.contributor.committeeMember Smet, Vanessa
dc.contributor.department Mechanical Engineering
dc.date.accessioned 2017-06-07T17:49:05Z
dc.date.available 2017-06-07T17:49:05Z
dc.date.created 2017-05
dc.date.issued 2017-04-24
dc.date.submitted May 2017
dc.date.updated 2017-06-07T17:49:06Z
dc.description.abstract Microelectronic packaging interconnects are subjected to mechanical damage due to thermal and power cycles, drop impact shock, and various vibration loads during application. As traditional microelectronic packaging interconnects are rigid, compliant interconnects are being pursued to facilitate more independent deformation between the substrate and the die while experiencing lower stress and strain, thus improving the overall mechanical reliability. However, though there have been studies that examine these interconnects under thermal fatigue and drop testing, the literature on vibration loading is scarce. This thesis characterizes the response of a compliant microelectronic packaging interconnect under random vibration loading and develops an assembly process flow that produces the most reliable bonded structures for testing. The interconnect used in the study is a 3-arc electroplated copper structure that serves as the Second-Level packaging interconnect. Random vibration loading is selected instead of sine sweep loading, as it produces a more realistic simulation of the conditions during application. A power spectral density spectrum analysis is used to calculate the stresses experienced under such fatigue loading through finite-element simulations. In parallel, silicon dies with compliant interconnects are assembled on organic substrates, and experimental vibration testing is conducted to determine the interconnect fatigue life. Based on simulations and experiments, a high cycle fatigue prediction methodology is developed for the compliant interconnect that can be employed for future design and analysis of compliant interconnects for various applications.
dc.description.degree M.S.
dc.format.mimetype application/pdf
dc.identifier.uri http://hdl.handle.net/1853/58321
dc.language.iso en_US
dc.publisher Georgia Institute of Technology
dc.subject Random vibration
dc.subject Electroplated copper
dc.subject Compliant interconnect
dc.title Vibration analysis of electroplated copper compliant interconnects
dc.type Text
dc.type.genre Thesis
dspace.entity.type Publication
local.contributor.advisor Sitaraman, Suresh K.
local.contributor.corporatename George W. Woodruff School of Mechanical Engineering
local.contributor.corporatename College of Engineering
relation.isAdvisorOfPublication 86701d63-9ca5-4060-89f8-aca6e0b267f6
relation.isOrgUnitOfPublication c01ff908-c25f-439b-bf10-a074ed886bb7
relation.isOrgUnitOfPublication 7c022d60-21d5-497c-b552-95e489a06569
thesis.degree.level Masters
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