Title:
Low temperature CVD reactor for silicon passivation
Low temperature CVD reactor for silicon passivation
dc.contributor.author | Kohl, Paul A. | |
dc.contributor.corporatename | Georgia Institute of Technology. Office of Sponsored Programs | en_US |
dc.contributor.corporatename | Georgia Institute of Technology. School of Chemical Engineering | en_US |
dc.date.accessioned | 2017-11-29T18:24:18Z | |
dc.date.available | 2017-11-29T18:24:18Z | |
dc.date.issued | 1992 | |
dc.description | Issued as final report | en_US |
dc.identifier.uri | http://hdl.handle.net/1853/59019 | |
dc.language.iso | en_US | en_US |
dc.publisher | Georgia Institute of Technology | en_US |
dc.relation.ispartofseries | School of Chemistry Engineering ; Project no. E-19-655 | en_US |
dc.subject | Metals | en_US |
dc.subject | Nitrogen content | en_US |
dc.title | Low temperature CVD reactor for silicon passivation | en_US |
dc.type | Text | |
dc.type.genre | Technical Report | |
dspace.entity.type | Publication | |
local.contributor.author | Kohl, Paul A. | |
relation.isAuthorOfPublication | 59670f7f-33e1-49ed-8098-ebe05443583b |