Title:
Low temperature CVD reactor for silicon passivation

dc.contributor.author Kohl, Paul A.
dc.contributor.corporatename Georgia Institute of Technology. Office of Sponsored Programs en_US
dc.contributor.corporatename Georgia Institute of Technology. School of Chemical Engineering en_US
dc.date.accessioned 2017-11-29T18:24:18Z
dc.date.available 2017-11-29T18:24:18Z
dc.date.issued 1992
dc.description Issued as final report en_US
dc.identifier.uri http://hdl.handle.net/1853/59019
dc.language.iso en_US en_US
dc.publisher Georgia Institute of Technology en_US
dc.relation.ispartofseries School of Chemistry Engineering ; Project no. E-19-655 en_US
dc.subject Metals en_US
dc.subject Nitrogen content en_US
dc.title Low temperature CVD reactor for silicon passivation en_US
dc.type Text
dc.type.genre Technical Report
dspace.entity.type Publication
local.contributor.author Kohl, Paul A.
relation.isAuthorOfPublication 59670f7f-33e1-49ed-8098-ebe05443583b
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