Title:
Contrast in four-beam-interference lithography
Contrast in four-beam-interference lithography
dc.contributor.author | Stay, Justin L. | en_US |
dc.contributor.author | Gaylord, Thomas K. | en_US |
dc.contributor.corporatename | Georgia Institute of Technology. Center for Organic Photonics and Electronics | en_US |
dc.contributor.corporatename | Georgia Institute of Technology. School of Electrical and Computer Engineering | en_US |
dc.date.accessioned | 2012-11-05T20:56:06Z | |
dc.date.available | 2012-11-05T20:56:06Z | |
dc.date.issued | 2008-07 | |
dc.description | © 2008 Optical Society of America | en_US |
dc.description | The definitive version of this paper is available at: http://dx.doi.org/10.1364/OL.33.001434 | en_US |
dc.description | DOI: 10.1364/OL.33.001434 | en_US |
dc.description.abstract | Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of four beams interference that satisfy the uniform contrast condition. Results are presented for three Bravais lattice structures: Base- and face-centered cubic and simple cubic. | en_US |
dc.identifier.citation | Stay, Justin L. and Gaylord, Thomas K., "Contrast in four-beam-interference lithography," Optics Letters, 33, 13, 1434-1436 (July 1 2008) | en_US |
dc.identifier.doi | 10.1364/OL.33.001434 | |
dc.identifier.issn | 0146-9592 | |
dc.identifier.uri | http://hdl.handle.net/1853/45244 | |
dc.language.iso | en_US | en_US |
dc.publisher | Georgia Institute of Technology | en_US |
dc.publisher.original | Optical Society of America | en_US |
dc.subject | Diffraction gratings | en_US |
dc.subject | Photonic crystals | en_US |
dc.subject | Microlithography | en_US |
dc.subject | Nanolithography | en_US |
dc.subject | Nanophotonics | en_US |
dc.title | Contrast in four-beam-interference lithography | en_US |
dc.type | Text | |
dc.type.genre | Article | |
dspace.entity.type | Publication | |
local.contributor.author | Gaylord, Thomas K. | |
local.contributor.corporatename | Center for Organic Photonics and Electronics | |
relation.isAuthorOfPublication | 517427a4-7861-4be9-93e0-6f49e3fa31ea | |
relation.isOrgUnitOfPublication | 43f8dc5f-0678-4f07-b44a-edbf587c338f |
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