Title:
Optical interferometric determination of in-plane residual stresses in SiO₂ films on silicon substrates
Optical interferometric determination of in-plane residual stresses in SiO₂ films on silicon substrates
| dc.contributor.author | Danyluk, Steven | |
| dc.contributor.author | Ghaffari, Kasey | |
| dc.contributor.corporatename | Georgia Institute of Technology. Office of Sponsored Programs | en_US |
| dc.contributor.corporatename | Georgia Institute of Technology. School of Mechanical Engineering | en_US |
| dc.date.accessioned | 2016-05-31T19:44:13Z | |
| dc.date.available | 2016-05-31T19:44:13Z | |
| dc.date.issued | 1994-04 | |
| dc.description | Issued as Report, Project E-25-564 | en_US |
| dc.description | Report has author: Kasey Ghaffari. | |
| dc.embargo.terms | null | en_US |
| dc.identifier | e-25-564 | |
| dc.identifier.uri | http://hdl.handle.net/1853/55095 | |
| dc.language.iso | en_US | en_US |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.relation.ispartofseries | School of Mechanical Engineering ; Project no. E-25-564 | en_US |
| dc.subject.lcsh | Metals Fatigue | |
| dc.subject.lcsh | Metallic films | |
| dc.subject.lcsh | Interferometry | |
| dc.subject.lcsh | Silica | |
| dc.title | Optical interferometric determination of in-plane residual stresses in SiO₂ films on silicon substrates | en_US |
| dc.type | Text | |
| dc.type.genre | Technical Report | |
| dspace.entity.type | Publication | |
| local.contributor.author | Danyluk, Steven | |
| relation.isAuthorOfPublication | 87cdff3a-1d95-4b3b-97f3-fa686905084b |