Title:
Low-voltage solution-processed n-channel organic field-effect transistors with high-k HfO₂ gate dielectrics grown by atomic layer deposition
Low-voltage solution-processed n-channel organic field-effect transistors with high-k HfO₂ gate dielectrics grown by atomic layer deposition
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Author(s)
Tiwari, Shree Prakash
Zhang, Xiaohong
Potscavage, William J., Jr.
Kippelen, Bernard
Zhang, Xiaohong
Potscavage, William J., Jr.
Kippelen, Bernard
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Abstract
High performance solution-processed n-channel organic field-effect transistors based on [6,6]-phenyl C61 butyric acid methyl ester with low operating voltages (3 V) are demonstrated using a high-k hafnium dioxide gate dielectric grown by atomic layer deposition. Devices exhibit excellent n-channel performance with electron mobility values up to 0.14 cm²/V s, threshold voltages of ∼ 0.3 V, current on/off ratios >10⁵, and very low values of subthreshold slope ( ∼ 140 mV/decade).
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2009-12
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Article