Photolithography at GT-IEN: An Overview of Processes and Equipment
Author(s)
Chen, Hang
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Abstract
Photolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate, or it can be directly written with a UV-laser equipment. It provides precise control of the shape and size of the objects it creates and can create patterns over an entire surface cost-effectively. The Georgia Tech Institute for Electronics and Nanotechnology (IEN) cleanroom provides various types of photolithography equipment to satisfy different processing needs. Each tool has its own unique characteristics and serves different purposes. In this seminar, a brief introduction to the equipment and patterning capabilities of the IEN will be presented. Common processing issues related to photolithography will also be discussed.
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Date
2020-05-14
Extent
54:37 minutes
Resource Type
Moving Image
Resource Subtype
Presentation