Title:
Simultaneous approach to model building and process design using experimental design: application to chemical vapor deposition

dc.contributor.advisor Grover, Martha A.
dc.contributor.author Wissmann, Paul J. en_US
dc.contributor.committeeMember Garmestani, Hamid
dc.contributor.committeeMember Hess, Dennis W.
dc.contributor.committeeMember McDowell, David
dc.contributor.committeeMember Nenes, Athanasios
dc.contributor.committeeMember Realff, Matthew
dc.contributor.department Chemical Engineering en_US
dc.date.accessioned 2009-01-22T15:44:32Z
dc.date.available 2009-01-22T15:44:32Z
dc.date.issued 2008-08-25 en_US
dc.description.abstract In this thesis a tool to be used in experimental design for batch processes is presented. Specifically, this method is to aid in the development of a process model. Currently, experimental design methods are either empirical in nature which need very little understanding of the underlying phenomena and without the objective of more fundamental understanding of the process. Other methods are model based which assume the model is correct and attempt to better define the model parameters or discriminate between models. This new paradigm for experimental design allows for process optimization and process model development to occur simultaneously. The methodology specifically evaluates multiple models as a check to evaluate whether the models are capturing the trend in the experimental data. A new tool for experimental design developed here is called the grid algorithm which is designed to constrain the experimental region to potential optimal points of the user defined objective function for the process. It accomplishes this by using the confidence interval on the objective function value. The objective function value is calculated using the model prediction of the best performing model among a set of models at the predicted optimal point. This new experimental design methodology is tested first on simulated data. The first simulation fits a model to data generated by the modified Himmelblau function (MHF). The second simulation fits multiple models to data generated to simulate a film growth process. In both simulations the grid algorithm leads to improved prediction at the optimal point and better sampling of the region around the optimal point. This experimental design method was then applied to an actual chemical vapor deposition system. The films were analyzed using atomic force microscopy (AFM) to find the resulting film roughness. The methodology was then applied to design experiments using models to predict roughness. The resulting experiments were designed in a region constrained by the grid algorithm and were close to the predicted optimum of the process. We found that the roughness of a thin film depended on the substrate temperature but also showed a relationship to the nucleation density of the thin film. en_US
dc.description.degree Ph.D. en_US
dc.identifier.uri http://hdl.handle.net/1853/26543
dc.publisher Georgia Institute of Technology en_US
dc.subject Nucleation density en_US
dc.subject UV adsorption en_US
dc.subject Hybrid models en_US
dc.subject Yttria oxide en_US
dc.subject Thin films en_US
dc.subject.lcsh Experimental design
dc.subject.lcsh Chemical vapor deposition
dc.subject.lcsh Mathematical optimization
dc.title Simultaneous approach to model building and process design using experimental design: application to chemical vapor deposition en_US
dc.type Text
dc.type.genre Dissertation
dspace.entity.type Publication
local.contributor.advisor Grover, Martha A.
local.contributor.corporatename School of Chemical and Biomolecular Engineering
local.contributor.corporatename College of Engineering
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