Title:
Fundamental understanding, characterization, passivation and gettering of electrically active defects in silicon

dc.contributor.advisor Rohatgi, Ajeet
dc.contributor.author Doolittle, William Alan en_US
dc.contributor.department Electric engineering en_US
dc.date.accessioned 2007-07-20T13:14:22Z
dc.date.available 2007-07-20T13:14:22Z
dc.date.issued 1996-05 en_US
dc.description.degree Ph.D. en_US
dc.identifier.bibid 423412 en_US
dc.identifier.uri http://hdl.handle.net/1853/15710
dc.publisher Georgia Institute of Technology en_US
dc.rights Access restricted to authorized Georgia Tech users only. en_US
dc.subject.lcsh Silicon defects en_US
dc.subject.lcsh Semiconductors Defects en_US
dc.title Fundamental understanding, characterization, passivation and gettering of electrically active defects in silicon en_US
dc.type Text
dc.type.genre Dissertation
dspace.entity.type Publication
local.contributor.advisor Rohatgi, Ajeet
local.contributor.author Doolittle, William Alan
local.contributor.corporatename School of Electrical and Computer Engineering
local.contributor.corporatename College of Engineering
relation.isAdvisorOfPublication b7cc3b55-ebc6-42fd-b859-107fb271b10d
relation.isAuthorOfPublication a8907c5a-5af0-429f-895f-30c9de6f8c15
relation.isOrgUnitOfPublication 5b7adef2-447c-4270-b9fc-846bd76f80f2
relation.isOrgUnitOfPublication 7c022d60-21d5-497c-b552-95e489a06569
Files
Original bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
doolittle_william_a_199605_phd_423412.pdf
Size:
30.94 MB
Format:
Adobe Portable Document Format
Description: