Title:
Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
Author(s)
Brown, Devin K.
Advisor(s)
Editor(s)
Collections
Supplementary to
Permanent Link
Abstract
The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography tools are known for ultra-high precision to fabricate small nano-structures with excellent reliability. The ELS G-100 is capable of generating patterns with a line width of 5 nm. A 20bit DAC provides high beam positioning resolution. In addition, the laser interferometer with its reading resolution of 0.31 nm enables a stitching accuracy of 15 nm and overlay accuracy of 20 nm. The tool features a maximum field size of 1 mm and a scanning frequency of 100 MHz. Sample sizes can be handled from small millimeter size pieces up to full 8” diameter wafers. This 30-minute webinar will provide an overview of the ELS-G100 system with a discussion of key features and capabilities followed by time for Q & A.
Sponsor
Date Issued
2020-05-07
Extent
62:44 minutes
Resource Type
Moving Image
Resource Subtype
Presentation