Title:
Chemical Vapor Deposition Of Group IB Metals
Chemical Vapor Deposition Of Group IB Metals
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Abstract
Coatings of Group IB metals are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula (I) where M is a Group IB metal such as copper, and R is a lower alkyl radical containing from 1 to about 6 carbon atoms, is contacted under nonoxidizing conditions with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula I is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as copper indium diselenide can be deposited from a copper oxide compound of formula I and a heat decomposable selenium and indium compounds under nonoxidizing conditions. Group II metal oxides and salts, such as barium titanate, are obtainable by deposition from a compound of formula I (and an additional organometallic compound when required) under oxidizing conditions.
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11/14/1989
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Patent