Title:
18% Large Area Screen-Printed Solar Cells on Textured MCZ Silicon with High Sheet Resistance Emitter
18% Large Area Screen-Printed Solar Cells on Textured MCZ Silicon with High Sheet Resistance Emitter
Author(s)
Ebong, Abasifreke
Upadhyaya, V.
Rounsaville, Brian
Kim, Dong Seop
Tate, K.
Rohatgi, Ajeet
Upadhyaya, V.
Rounsaville, Brian
Kim, Dong Seop
Tate, K.
Rohatgi, Ajeet
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Abstract
In this paper we report on high efficiency screen-printed 49 cm(2) solar cells fabricated on randomly textured float zone (1.2 Ω-cm) and magnetic Czochralski (MCz) silicon with resistivities of 1.2 and 4.8 Ω-cm, respectively. A simple process involving POCl3 diffused emitters, low frequency PECVD silicon nitride deposition, Al back contact print, Ag front grid print followed by co-firing of the contacts and forming gas anneal produced efficiencies of 17.6% on 1.2 Ω-cm textured float zone Si, 17.9% on 1.2 Ω-cm MCz Si and 18.0% on 4.8 Ω-cm MCz Si. A combination of high sheet resistance emitter (~95 Ω-/ ) and the surface texturing resulted in a short circuit current density of 37.8 mA/cm(2) in the 4.8 Ω-cm MCz cell, 37.0 mA/cm(2) in the 1.2 Ω-cm(2) MCz cell and 36.5 mA/cm(2) in the 1.2 Ω-cm(2) float zone cell. The open circuit voltages were consistent with the base resistivities of the two materials. The fill factors were in the range of 0.760-0.770 indicating there is considerable room for improvement. Detailed modeling and analysis is performed to explain the cell performance and provide guidelines for achieving 20% efficient screen-printed cells on MCZ Si.
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Date Issued
2006-05
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Proceedings