Photoresist removal using low molecular weight alcohols and IPA-based solutions

Author(s)
Gao, Karen Ging
Advisor(s)
Editor(s)
Associated Organization(s)
Organizational Unit
School of Chemical and Biomolecular Engineering
School established in 1901 as the School of Chemical Engineering; in 2003, renamed School of Chemical and Biomolecular Engineering
Organizational Unit
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Abstract
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Date
2001-05
Extent
235 bytes
Resource Type
Text
Resource Subtype
Thesis
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