Soft Lithography Methods of Fabrication

Joseph, Paul J.

Title:

Soft Lithography Methods of Fabrication

dc.contributor.author	Joseph, Paul J.
dc.contributor.corporatename	Georgia Institute of Technology. Institute for Electronics and Nanotechnology	en_US
dc.contributor.corporatename	Southeastern Nanotechnology Infrastructure Corridor	en_US
dc.date.accessioned	2020-05-15T19:25:52Z
dc.date.available	2020-05-15T19:25:52Z
dc.date.issued	2020-04-29
dc.description	Presented on April 29, 2020 from 11:00 a.m.-12:00 p.m. SENIC Technical Webinar Series: Session 2.	en_US
dc.description	The Southeastern Nanotechnology Infrastructure Corridor (SENIC) housed at the Institute for Electronics and Nanotechnology at Georgia Tech hosted a series of online technical seminars, open to the academic and industrial community with an interest in cleanroom fabrication and processing for materials, biological, and electronics research.	en_US
dc.description	Paul J Joseph received his PhD in Physical Chemistry from the University of Madras, India in 1997. From 1997 to 2000, he was a Visiting Scientist for the National Science Council of Taiwan at the National Tsing Hua University. From 2001, he was a Research faculty at the School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, Atlanta, GA. His research focused towards the development of new sacrificial polymeric materials and its application in the field of Microelectronics, Microfluidics, and Microelectromechanical Systems. Dr. Joseph is currently a Principal Research Scientist and is also serving as an external user coordinator at the GT-Institute for Electronics & Nanotechnology and his current research interests are in Nano-biotechnology, Bio- MEMS, Microfluidics, and Biosensors’ application as Diagnostics and Detection Systems. Dr. Joseph’s original research work overall resulted in 85 publications, reports, conference presentations, trade publications, and 7 awarded US and international patents.	en_US
dc.description	Runtime: 61:44 minutes	en_US
dc.description.abstract	Soft lithography (SL) refers to a family of techniques for fabricating or replicating structures using elastomeric stamps, molds, and conformable photomasks. Fabrication of microfluidic devices by SL is the most popular approach due to simplicity and low cost. In this approach PDMS (polydimethylsiloxane) is cast on a SU-8 master mold to generate elastomeric stamps that are then sealed against glass slides using oxygen plasma. SL plays a vital role in microfluidics, ranging from simple channel fabrication with inlet/outlet to the creation of micropatterns onto a substrate surface. SL includes a collection of fabrication methods that are all based on using an elastomeric (or PDMS) stamp. These methods with reference to Microfluidics device fabrication (µDF), Replica Molding (REM), Micro-contact printing (µCP), Micro-transfer molding (µTM), and Micro-molding in capillaries (MIMIC) will be presented. The goal for this presentation is to impart a basic understanding of soft lithography for microfluidic applications as practiced in academia and industry.	en_US
dc.format.extent	61:44 minutes
dc.identifier.uri	http://hdl.handle.net/1853/62583
dc.language.iso	en_US	en_US
dc.publisher	Georgia Institute of Technology	en_US
dc.relation.ispartof	Southeastern Nanotechnology Infrastructure Corridor (SENIC)
dc.subject	Elastomeric stamp	en_US
dc.subject	Micro-contact printing	en_US
dc.subject	Microfluidics device fabrication	en_US
dc.subject	Micro-molding in capillaries	en_US
dc.subject	Micro-transfer molding	en_US
dc.subject	Nanotechnology	en_US
dc.subject	Polydimethylsiloxane	en_US
dc.subject	Replica molding	en_US
dc.subject	Soft lithography
dc.title	Soft Lithography Methods of Fabrication	en_US
dc.type	Moving Image
dc.type.genre	Presentation
dspace.entity.type	Publication
local.contributor.corporatename	Institute for Electronics and Nanotechnology (IEN)
relation.isOrgUnitOfPublication	5d316582-08fe-42e1-82e3-9f3b79dd6dae