Study of stress measurement using polariscope
Author(s)
Li, Fang
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Abstract
The goal of this research was to investigate an experimental infrared transmission technique to extract the full stress components of the in-plane residual stresses in thin multi crystalline silicon wafer, and try to meet the need of photovoltaic industry to in situ measure residual stress for large cast wafers.
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Date
2010-05-18
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Text
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Dissertation