Modeling of multiple-optical-axis pattern-integrated interference lithography systems
Author(s)
Sedivy, Donald E.
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Abstract
The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality and collimation are individually and jointly optimized for these lenses. Example images for a jointly optimized system are simulated using a combination of ray tracing and Fourier analysis. Even with these non-optimized components, reasonable fidelity is shown to be possible.
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Date
2014-03-31
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Text
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Thesis