A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films
Author(s)
Lee, Cheng-Tsung
Yueh, Wang
Roberts, Jeanette
Henderson, Clifford L.
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Abstract
A method which utilizes experimental measurement and modeling of photoacid-catalyzed deprotection rates obtained via Fourier transform infrared spectroscopy has been developed for determining photoacid generator PAG photoreaction rate constants i.e., Dill C parameters in protected polymer matrices. Numerical modeling of deprotection rates as a function of exposure dose and postexposure bake time is used to determine the Dill C parameters for the PAG in the actual resist matrix polymer of interest. This protocol is shown to be a fast, nondestructive, and material-saving technique that can permit measurement of Dill C parameters in reactive polymer matrixes.
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Date
2007
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Article