Title:
Three-beam-interference lithography: contrast and crystallography
Three-beam-interference lithography: contrast and crystallography
| dc.contributor.author | Stay, Justin L. | en_US |
| dc.contributor.author | Gaylord, Thomas K. | en_US |
| dc.contributor.corporatename | Georgia Institute of Technology. Center for Organic Photonics and Electronics | en_US |
| dc.contributor.corporatename | Georgia Institute of Technology. School of Electrical and Computer Engineering | en_US |
| dc.date.accessioned | 2012-11-16T21:01:02Z | |
| dc.date.available | 2012-11-16T21:01:02Z | |
| dc.date.issued | 2008-06 | |
| dc.description | © 2008 Optical Society of America. The definitive version of this paper is available at: http://dx.doi.org/10.1364/AO.47.003221 | en_US |
| dc.description | DOI: 10.1364/AO.47.003221 | en_US |
| dc.description.abstract | Specific configurations of three linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting symmetry inherent in 5 of the 17 plane groups. Starting with the general expression for N linearly polarized waves, three-beam interference is examined in detail. The totality of all possible sets of constraints for producing the five plane groups is presented. In addition, two uniform contrast conditions are identified and discussed. Further, it is shown that when either of the uniform contrast conditions is applied and the absolute contrast is maximized, unity absolute contrast is achievable. | en_US |
| dc.identifier.citation | Stay, Justin L. and Gaylord, Thomas K., "Three-beam-interference lithography: contrast and crystallography," Applied Optics, 47, 18, 3221-3230 (June 20 2008) | en_US |
| dc.identifier.doi | 10.1364/AO.47.003221 | |
| dc.identifier.issn | 0003-6935 | |
| dc.identifier.uri | http://hdl.handle.net/1853/45413 | |
| dc.language.iso | en_US | en_US |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.publisher.original | Optical Society of America | en_US |
| dc.subject | Diffraction gratings | en_US |
| dc.subject | Imaging systems | en_US |
| dc.subject | Microlithography | en_US |
| dc.subject | Optical design and fabrication | en_US |
| dc.subject | Lithography | en_US |
| dc.subject | Imaging systems | en_US |
| dc.subject | Nanolithography | en_US |
| dc.subject | Optics | en_US |
| dc.subject | Nanophotonics | en_US |
| dc.subject | Photonic crystals | en_US |
| dc.title | Three-beam-interference lithography: contrast and crystallography | en_US |
| dc.type | Text | |
| dc.type.genre | Article | |
| dspace.entity.type | Publication | |
| local.contributor.author | Gaylord, Thomas K. | |
| local.contributor.corporatename | Center for Organic Photonics and Electronics | |
| relation.isAuthorOfPublication | 517427a4-7861-4be9-93e0-6f49e3fa31ea | |
| relation.isOrgUnitOfPublication | 43f8dc5f-0678-4f07-b44a-edbf587c338f |
Files
Original bundle
1 - 1 of 1