Title:
Real-time monitoring and control of reactive ion etching using neural networks
Real-time monitoring and control of reactive ion etching using neural networks
| dc.contributor.advisor | May, Gary S. | |
| dc.contributor.author | Stokes, Charles David | en_US |
| dc.contributor.department | Electrical and Computer Engineering | en_US |
| dc.contributor.department | Electric Engineering | en_US |
| dc.date.accessioned | 2007-02-09T20:58:38Z | |
| dc.date.available | 2007-02-09T20:58:38Z | |
| dc.date.issued | 2000-08 | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.format.extent | 241 bytes | |
| dc.format.mimetype | text/html | |
| dc.identifier.bibid | 562772 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1853/13422 | |
| dc.language.iso | en_US | |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.rights | Access restricted to authorized Georgia Tech users only. | en_US |
| dc.subject.lcsh | Etching | en_US |
| dc.subject.lcsh | Computer networks | en_US |
| dc.subject.lcsh | Semiconductors | en_US |
| dc.title | Real-time monitoring and control of reactive ion etching using neural networks | en_US |
| dc.type | Text | |
| dc.type.genre | Dissertation | |
| dspace.entity.type | Publication | |
| local.contributor.corporatename | School of Electrical and Computer Engineering | |
| local.contributor.corporatename | College of Engineering | |
| relation.isOrgUnitOfPublication | 5b7adef2-447c-4270-b9fc-846bd76f80f2 | |
| relation.isOrgUnitOfPublication | 7c022d60-21d5-497c-b552-95e489a06569 |
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