Title:
Optical interferometric measurement of in-plane residual stresses in SiO₂ films on silicon substrates
Optical interferometric measurement of in-plane residual stresses in SiO₂ films on silicon substrates
| dc.contributor.advisor | Danyluk, Steven | |
| dc.contributor.author | Ghaffari, Kasra | en_US |
| dc.contributor.department | Mechanical engineering | en_US |
| dc.date.accessioned | 2007-09-28T11:31:05Z | |
| dc.date.available | 2007-09-28T11:31:05Z | |
| dc.date.issued | 1995-08 | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.identifier.bibid | 413553 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1853/16815 | |
| dc.publisher | Georgia Institute of Technology | en_US |
| dc.rights | Access restricted to authorized Georgia Tech users only. | en_US |
| dc.subject.lcsh | Interferometry | en_US |
| dc.subject.lcsh | Residual stresses | en_US |
| dc.subject.lcsh | Silica | en_US |
| dc.title | Optical interferometric measurement of in-plane residual stresses in SiO₂ films on silicon substrates | en_US |
| dc.type | Text | |
| dc.type.genre | Dissertation | |
| dspace.entity.type | Publication | |
| local.contributor.advisor | Danyluk, Steven | |
| local.contributor.corporatename | George W. Woodruff School of Mechanical Engineering | |
| local.contributor.corporatename | College of Engineering | |
| relation.isAdvisorOfPublication | 87cdff3a-1d95-4b3b-97f3-fa686905084b | |
| relation.isOrgUnitOfPublication | c01ff908-c25f-439b-bf10-a074ed886bb7 | |
| relation.isOrgUnitOfPublication | 7c022d60-21d5-497c-b552-95e489a06569 |
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