Title:
Overlay Measurement Methods With Firat Based Probe Microscope

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dc.contributor.patentcreator Degertekin, Fahrettin Levent
dc.date.accessioned 2017-05-12T14:28:36Z
dc.date.available 2017-05-12T14:28:36Z
dc.date.filed 10/11/2006
dc.date.issued 12/9/2008
dc.description.abstract A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.
dc.description.assignee Georgia Tech Research Corporation
dc.identifier.cpc B82Y35/00
dc.identifier.cpc G01Q70/02
dc.identifier.cpc G01Q60/38
dc.identifier.patentapplicationnumber 11/548531
dc.identifier.patentnumber 7461543
dc.identifier.uri http://hdl.handle.net/1853/57773
dc.identifier.uspc 73/105
dc.title Overlay Measurement Methods With Firat Based Probe Microscope
dc.type Text
dc.type.genre Patent
dspace.entity.type Publication
local.contributor.corporatename Georgia Institute of Technology
local.relation.ispartofseries Georgia Tech Patents
relation.isOrgUnitOfPublication cc30e153-7a64-4ae2-9b1d-5436686785e3
relation.isSeriesOfPublication 0f49c79d-4efb-4bd9-b060-5c7f9191b9da
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