Title:
Overlay Measurement Methods With Firat Based Probe Microscope
Overlay Measurement Methods With Firat Based Probe Microscope
Files
Authors
Authors
Advisors
Advisors
Associated Organizations
Organizational Unit
Series
Series
Collections
Supplementary to
Permanent Link
Abstract
A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.
Sponsor
Date Issued
12/9/2008
Extent
Resource Type
Text
Resource Subtype
Patent